Magnetron sputtering technology, film quality is good, even better. Multiple sets of cathode and flexible combination, using a new type of design of flat or cylindrical rotating magnetic target, with DC, if, or RF sputtering power.Can be plated on the metal film, alloy film, or by reactive sputtering technology, such as plating film.Can be used in multi room building block structure, can achieve a large area, high efficiency of continuous production.Fully automatic control system, the use of industrial control computer control, color touch screen interface, to achieve full automation of equipment operation.Vertical structure, small size, and can be a single or double sided coating.Equipment can be designed to pump, diffusion pump, or low temperature pump pumping system, can also be based on the need to select the linear ion source, PECVD (plasma) gas deposition device, as well as online monitoring system to enhance the function and quality of the coating.
Work flow:
The workpiece is fed into the sheet chamber, and the workpiece is plated with an ion bombardment or heat treatment (glow), and the workpiece through one or more coating chambers, and is deposited on a single or multi-layer film, to meet a variety of applications.Through the transition chamber and into the film chamber, the coating process is over.The output was detected after unloading, the workpiece frame transported back into the end piece, waiting for loading and prepare for the next process.
(the above are the general case, our company designs are special custom, satisfy the customer each kind of different need, welcome to consult)